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Thin Film Thickness Measurement

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The thickness measurement system was designed for measuring the thin-film thickness for research & development as well as production line of; Semiconductor, FPD, Nanotechnology, Electronic materials and Special films. For example, in the semiconductor industry, each thin film deposition on the wafer should be acquired accurately based on the design. The thin film thickness system is used to monitor the process and determine the quality of product by measuring the thickness of thin film. There are various methods to measure film thickness. Stylus based Mechanical technology; Microscopic technology and Optical technology are generally used among them. Spectra Thick, K-Mac’s Thin Film Thickness Measurement System, is an adapted optical technology method. Thus the interference phenomenon between the reflected lights on the film surface and the substrate surface or the phase difference of lights determines the properties of the film. In this way we can measure not only the film thickness but also the optical constant. If the film is transparent and maintains the optical interference, any sample can be measured with Spectra Thick. Each layer’s thickness of the multilayer film can be measured via mathematical calculation. Thanks to a user-friendly interface, the operation is easy. No damage is caused to the sample and a wide range of thickness, from Å to dozens , can be rapidly measured.
Reflectometer method was applied to analyze the thickness of the sample.The film thickness and optical constants measurementMultilayer measurement.

  • Non-Contact/Non-Destructive
  • Reflectometer
  • Real-time measurement, Multi-spot display
  • Windows based S/W (Excel, Origin, MS-Word save)
  • Various n, k model (Cauchy, Cauchy Expotential, Sellmeier)
  • 2D, 3D mapping data Display (point by point)
  • Semi-automatic mechanism stage control
  • Fast measurement, Easy operation
  • CCD Camera + Auto Focusing


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